Infrared Characterization for Microelectronics

Infrared Characterization for Microelectronics

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Most of the books on infrared characterization are for applications in chemistry and no book has been dedicated to infrared characterization for microelectronics. The focus of the book will be on practical applications useful to the production line and to the research and development of microelectronics. The background knowledge and significance of doing a particular type of infrared measurement will be discussed in detail. The principal purpose of the book is to serve as a useful handbook for practising engineers and scientists in the field of microelectronics. Contents:Introduction to Infrared SpectroscopyThe Properties of Infrared Transparent SubstratesThe Measurement of Oxygen and Carbon and Other Impurities in SiliconThe Measurement of Epitaxial Layer ThicknessThe Characterization of Silicon Dioxide and Silicon Nitride Thin FilmsThe Characterization of PSG, BPSG, SOG and Other GlassesThe Characterization of Amorphous Silicon and Related MaterialsMiscellaneous Applications of Infrared Spectroscopy to Microelectronics Readership: Materials scientists and engineers. keywords:Vibrational Spectroscopy;FTIR;DIR;ATR;Oxygen in Silicon;Carbon in Silicon;Epitaxial Layer Thickness;Silicon Dioxide Film;Silicon Nitride Film;PSG;BPSG;SOG;Amorphous Silicon;Amorphous Carbon;Diamond Like Carbon;Diamond;Microcrystalline Silicon;SIMOX;Silicon Wafer Bonding;Cleaning;EL2;GaAs;GaN;ZnSe;Low-K Dielectric8.15 A schematic diagram of the apparatus for infrared light scattering tomography. ... |R TV camera er CRT |R-microscopy cleaved surface B cleaved surface A \, 90a#39;scattering light Incident light sample - a#39;a#39;, PC polished surfac sample stage Fig.

Title:Infrared Characterization for Microelectronics
Author: W S Lau
Publisher:World Scientific - 1999-10-01

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